Год выпуска: 2011 Автор: Sarvesh K Tripathi Издательство: LAP Lambert Academic Publishing Страниц: 156 ISBN: 9783847333098
Описание
The necessity of miniaturization of the devices expands the scope of nanotechnology. In recent years, researchers have poured in a lot of effort in the development of nanoscale devices. The focused ion beam (FIB) has proven itself as a very powerful and unique technique for nanofabrication. FIB induced micro / nanofabrication fundamentally involves two basic phenomena namely sputtering and molecular cracking, leading to the material removal and material deposition, respectively. In the present work the basic physical processes involved in the FIB induced deposition have been investigated and the correlation between ion beam parameters and physical characteristics of FIB fabricated nanostructures has been studied. There are a number of other physical phenomena viz. scattering, redeposition, secondary electron / photon emission and localized heating etc. which may occur when the incident ions interact with the substrate during the FIB processing, and intricately influence the...