Год выпуска: 2010 Автор: Xu Ma, Gonzalo R. Arce Издательство: John Wiley and Sons, Ltd Страниц: 244 ISBN: 978-0-470-59697-5
Описание
The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the ОРС, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented.
