Thin-Film Deposition: Principles and Practice Год выпуска: 1995Автор: Donald L. SmithИздательство: McGraw-Hill Professional PublishingСтраниц: 616ISBN: 9780070585027Описание Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description of the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.
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